Research Associate Physics
Bnl ยท New York
๐ Upton, NYvia workdayFirst listed here 2026-09-17
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Brookhaven National Laboratory (BNL) is entering an exciting new chapter with one of the newest and most advanced synchrotron facilities in the world. National Synchrotron Light Source II (NSLS-II) enables the study of material properties and functions with nanoscale resolution and exquisite sensitivity by providing world-leading capabilities for X-ray imaging and high-resolution energy analysis. This facility is open to users from academia and industry, and its operations are at a time when the world enters a new era with a global economy fueled largely by scientific discoveries and technological innovations. NSLS-II provides the research tools needed to foster new discoveries and create breakthroughs in critical areas such as energy security, environment, and human health.
Position Description
The Optics Group at the National Synchrotron Light Source II (NSLS-II) is seeking a Research Associate specializing in optical metrology for X-ray mirrors. The selected candidate will advance precision measurement and characterization of ultra-precision X-ray optics using the Optical Coordinate Measuring Machine (OCMM) platform. Working within the P3N (Pioneering Nanometrology and Nanofabrication for Next-Generation X-ray Mirrors) program, you will establish measurement workflows, validate metrology techniques, and contribute directly to enabling next-generation synchrotron capabilities.
The OCMM is a key measurement platform for deterministic fabrication of high-curvature and freeform X-ray mirrors. You will develop and validate a documented, repeatable OCMM workflow capable of single-nanometer-level surface-height measurements. Your work will integrate baseline hardware characterization, reconstruction algorithm conditioning, software workflow development, and mirror validation against established BNL reference metrology methods. You will diagnose error sources, optimize measurement geometry, preserve data traceability, and produce analysis outputs suitable for fabrication feedback and comparison with reference techniques such as the Nano-accuracy Surface Profiler (NSP), Fizeau Stitching Interferometry (FSI), and Coherent Scanning Interferometry (CSI).
Essential Duties and Responsibilities:
Establish and document the OCMM baseline, including hardware configuration, sensor and stage behavior, calibration records, and reproducible operating procedures.
Perform controlled experiments to characterize and separate sensor noise, mounting compliance, mechanical drift, thermal effects, and reconstruction-induced errors.
Diagnose sensor range limitations and data dropouts, then develop protocols to flag invalid or marginal measurements and evaluate their impact on reconstructed profiles.
Improve the robustness of the OCMM surface-reconstruction method using singular value decomposition to identify and characterize poorly constrained measurement modes.
Screen and optimize candidate measurement geometries through analytical analysis and experimental validation.
Develop and integrate validated scan and reconstruction strategies into acquisition and analysis software.
Implement quality checks and automated diagnostics to detect anomalous inputs, missing samples, range violations, inconsistent geometries, and configuration mismatches.
Validate the controlled OCMM workflow using progressively more demanding X-ray mirror reference surfaces.
Compare OCMM measurements with high-quality reference data from NSP, FSI, CSI, and other BNL metrology methods, document registration, filtering, aperture, and quantitative agreement or discrepancies.
Provide root-cause analysis when hardware limits prevent reliable measurement of demanding mirrors and identify mitigation strategies or system upgrades.
Publish results in peer-reviewed journal articles.
Present research work and results to management and scientific conferences.
Demonstrated commitment to working safely, acting ethically, and taking personal accountability for operational excellence.
Required Knowledge, Skills, and Abilities:
Ph.D. degree in Physics, Optical Engineering, Mathematics, Mechanical Engineering, or related discipline.
Strong knowledge of optical metrology and precision measurement techniques.
Demonstrated experience with optical instruments and characterization methods (e.g., interferometry, microscopy, phase measurement).
Proven skill in sensor integration, data acquisition, and control systems.
Demonstrated expertise in algorithm development for metrology and data analysis.
Strong capability in experimental design, analytical methods, and numerical modeling.
Excellent programming skills for data acquisition, signal processing, and analysis.
Self-motivated, creative, and able to work independently on complex technical problems.
Preferred Knowledge, Skills, and Abilities:
Hands-on experience with optical surface profiling instruments or precision metrology systems.
Fluency in Python, MATLAB, or Julia for scientific computing and data visualization.
Experience with C++ for hardware and software integration.
Knowledge of reconstruction algorithms, fringe analysis, or phase measurement techniques.
Familiarity with machine learning and artificial intelligence applications in metrology or instrumentation.
Experience with numerical methods, matrix analysis, or singular value decomposition.
Background in synchrotron science, X-ray optics, or related high-energy physics instrumentation.
Exposure to version control systems and collaborative software development practices.
Other Information:
Occasional travel requirements
At Brookhaven National Laboratory we believe that a comprehensive employee benefits program is an important and meaningful part of the compensation employees receive. Our benefits program includes, but is not limited to:
Medical, Dental, and Vision Care Plans
Flexible Spending Accounts
Paid Time-off and Leave Programs (vacation, holidays, sick leave,
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